Enhancing Semiconductor Gas Purity Monitoring with Analytical Industries' PI2 Oxygen Analyzer

Gas Detection

Enhancing Semiconductor Gas Purity Monitoring with Analytical Industries' PI2 Oxygen Analyzer

Maintaining ultra-high purity (UHP) gases is non-negotiable in high-precision semiconductor manufacturing. Even trace contaminants, measured in parts per billion (ppb), can compromise entire batches of wafers, costing manufacturers time and money. Accurately and reliably measuring oxygen and other trace impurities is crucial for ensuring process quality control and safety during operations.

Ultra-Trace Oxygen Monitoring with the PI2-MS Series

The PI2-MS from Analytical Industries has been designed to measure oxygen as a contaminant in UHP gases. One of the core applications of the PI2-MS is measuring the oxygen concentration in purge or process feed gases within a semiconductor manufacturing facility.

This analyzer uses AII's proprietary second-generation Pico-Ion electrochemical sensor to deliver a fast response, stable and accurate real-time measurement . With a low detection limit (LDL) of < 2.5 ppb, the PI2-MS is up to the task.

The PI2-MS is designed with flexibility and integration in mind. Engineers can select from bench-top/portable, panel, or wall-mount configurations depending on the installation environment. This analyzer ensures seamless integration across semiconductor gas distribution and purification systems, whether used for fixed process monitoring or spot-checking gas lines.

Why Trace-Level Oxygen Detection Matters in Semiconductor Manufacturing

Semiconductor fabrication demands extreme precision, particularly in processes like plasma etching, chemical vapor deposition (CVD), and silicon wafer heat treatment. During these procedures, gases like nitrogen (N₂), argon (Ar), hydrogen (H₂), and silane should be free of contaminants. Even in trace amounts, oxygen can alter chemical reactions, create defects in wafers, or degrade deposition layers.

The PI2-MS analyzer, with its quick measurement response and recovery from upset conditions, allows users to monitor oxygen levels in real time and take corrective action before contamination affects production.

Innovative Design for High-Purity Environments

The analyzer's ultra-clean sample system is built for demanding applications, featuring:

  • Stainless steel wetted parts and orbitally welded connections (optional)
  • An integrated bypass system to protect the sensor from high-concentration oxygen spikes
  • Easily replaceable sealed Oxygen sensor to ensure operational hours and quality
  • Analog and digital communications for easy integration into process control systems
  • Optional zero gas generation capability for easy zero gas calibration
  • This high-integrity engineered analyzer maintains consistent measurement performance through proven sensor technology, sample gas pressure, and flow control on dynamic process systems for UHP gas applications worldwide.


    Long Sensor Life and Low Cost of Ownership
    Long Sensor Life and Low Cost of Ownership

    Long Sensor Life and Low Cost of Ownership

    Aii's electrochemical sensor technology offers a typical operational lifespan of 12 to 24 months, depending on the specific application and environmental conditions. The sensor is designed to enable easy replacement and does not require routine electrolyte replenishment. Compared to zirconium oxide and paramagnetic analyzers, the PI2's minimal calibration requirements and reduced maintenance demands result in lower ongoing operating costs and improved field serviceability.

    Key Applications in Semiconductor and Specialty Gas Processing

    The PI2-MS analyzer is already in use across a variety of high-purity applications, including:

  • Gas purity verification in N₂, H₂, Ar, and other UHP gas supply lines
  • Feed gas monitoring for semiconductor tools and process chambers
  • Spot-checking and mobile validation in semiconductor facilities before handing over to production using portable analyzer configuration
  • UHP purge gas monitoring of gloveboxes and containment systems in Space, Aerospace, Defense, and Nuclear industries
  • Specialist metal and silicon wafer processing
  • UHP gas generation and treatment plants
  • Aii also offers a wide range of ppm oxygen analyzers for safe and hazardous area applications, enabling measurements in other parts of a facility, such as N2 gas generation before gas treatment or oxygen concentrators.

    A Complete Trace Impurity Monitoring Solution

    Beyond oxygen, AII and its partner brands offer an integrated solution for trace impurity monitoring, including moisture analyzers and process gas chromatographs. These tools support the detection of critical impurities in gases like moisture, helium, hydrogen, silane, germane, nitrogen trifluoride, and others, ensuring the consistent delivery of UHP gases from generation, distribution, and process use.

    With the ability to combine multiple measurement parameters into a single system, users benefit from both space and cost savings while maintaining compliance with industry standards.

    In Conclusion

    As semiconductor feature sizes shrink and production precision grows, the tolerance for contamination drops. The PI2-MS oxygen analyzer offers a high-accuracy, low-maintenance solution for ultra-trace oxygen monitoring in critical gas streams. Its configuration adaptability, measurement accuracy, and robust sensing technology design make it a trusted choice for engineers in high-purity and ultra-high-purity gas applications.

    If you're tasked with maintaining gas purity in a semiconductor fab, specialty gas plant, or advanced materials facility, the PI2-MS provides proven performance with long-term value.


    To discuss your application or for further information, please contact one of our highly trained engineers today.



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